Journal
APPLIED PHYSICS EXPRESS
Volume 5, Issue 7, Pages -Publisher
JAPAN SOC APPLIED PHYSICS
DOI: 10.1143/APEX.5.071301
Keywords
-
Categories
Funding
- EPSRC Renaissance Germanium'' [EP/F031408/1]
- NANOSIL Network of Excellence
- European Commission 7th Framework Programme (ICT-FP7) [216171]
- Engineering and Physical Sciences Research Council [EP/J001074/1, EP/F031408/1] Funding Source: researchfish
Ask authors/readers for more resources
Epitaxial growth of thick Ge layers on a (111)-Si substrate has been investigated. We demonstrate that the residual compressive strain in a thin, partially relaxed Ge seed layer can be exploited to promote an intermediate islanding step, significantly reducing the threading dislocation density (similar to 3 x 10(8) cm(-2)) and almost entirely suppressing stacking fault formation. The higher Ge growth rate on the {113} sidewalls of the islands compared to the (111) top surface results in a smooth layer with a low rms surface roughness of 2 nm. Such layers have the potential to be extremely important in realizing next-generation high-mobility n-channel transistors. (c) 2012 The Japan Society of Applied Physics
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available