Journal
APPLIED PHYSICS EXPRESS
Volume 3, Issue 5, Pages -Publisher
JAPAN SOC APPLIED PHYSICS
DOI: 10.1143/APEX.3.056701
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Funding
- SENTAN, Japan Science and Technology Agency
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X-ray photoelectron diffraction has become a common method to determine element-specific local atomic surface structure. The use of hard Xrays makes this method bulk-sensitive and capable of studying the atomic structure of new materials such as multilayers and buried layers. We present the first Cr K alpha-excited angle-resolved photoelectron diffraction from Si(001) covered by a 0-7-nm-thick SiO2 layer and demonstrate the information depth of this technique. The measured results are compared with a cluster model simulation. (C) 2010 The Japan Society of Applied Physics
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