Journal
APPLIED PHYSICS EXPRESS
Volume 2, Issue 8, Pages -Publisher
IOP PUBLISHING LTD
DOI: 10.1143/APEX.2.085502
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Funding
- Global Center of Excellence (COE) Program for Chemistry Innovation through Cooperation of Science and Engineering
- Ministry of Education, Culture, Sports, Science and Technology (MEXT), Japan
- Grants-in-Aid for Scientific Research [23760052] Funding Source: KAKEN
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Epitaxial thin films of layered-rhombohedral LiCoO2 (alpha-NaFeO2 structure, R (3) over barm) have been successfully grown on Al2O3(0001) substrates using pulsed laser deposition. A single phase of LiCoO2 was obtained in the narrow substrate temperature range of 250-300 degrees C, above which secondary phases, such as Co2O3, Co3O4, and LiCo2O4, appeared. In addition, it was found that annealing of precursor films deposited at room temperature yielded atomically flat LiCoO2 films with a surface roughness of similar to 0.2 nm. (C) 2009 The Japan Society of Applied Physics
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