Journal
ULTRAMICROSCOPY
Volume 102, Issue 3, Pages 199-207Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.ultramic.2004.09.010
Keywords
EELS; ELNES; silicon L23 edge; channeling
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As an electron beam (of order 100 keV) travels through a crystalline solid it can be channeled down a zone axis of the crystal to form a channeling peak centered on the atomic columns. The channeling peak can be similar in size to the outer atomic orbitals. Electron energy loss spectroscopy (EELS) measures the losses that the electron experiences as it passes through the solid yielding information about the unoccupied density of states in the solid. The interaction matrix element for this process typically produces dipole selection rules for small angle scattering. In this paper, a theoretical calculation of the EELS cross section in the presence of strong channeling is performed for the silicon L23 edge. The presence of channeling is found to alter both the intensity and selection rules for this EELS signal as a function of depth in the solid. At some depths in the specimen small but significant non-dipole transition components can be produced. which may influence measurements of the density of states in solids. (C) 2004 Elsevier B.V. All rights reserved.
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