Journal
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
Volume 80, Issue 3, Pages 461-465Publisher
SPRINGER HEIDELBERG
DOI: 10.1007/s00339-004-3093-0
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We report direct laser writing of lithography patterns with a feature width of 20 +/- 5 nm on thin photoresist film by combining a double-frequency femtosecond laser and a near-field scanning optical microscope. The obtained feature size is much smaller than the laser wavelength (lambda) and the aperture diameter (d) with a resolution of lambda/20 and d/2, respectively. The lithography patterns were analyzed with an atomic force microscope and a scanning electron microscope. The effects of laser energy and writing speed on the feature size were investigated. The underlying physical mechanism was also discussed.
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