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Interlayer-related paramagnetic defects in stacks of ultrathin layers of SiOx, Al2O3, ZrO2, and HfO2 on (100)Si -: art. no. 033510

JOURNAL OF APPLIED PHYSICS (2005)

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Interlayer-related paramagnetic defects in stacks of ultrathin layers of SiOx, Al2O3, ZrO2, and HfO2 on (100)Si -: art. no. 033510

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