Journal
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
Volume 111, Issue 1, Pages 261-264Publisher
SPRINGER HEIDELBERG
DOI: 10.1007/s00339-012-7474-5
Keywords
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Funding
- Alexander von Humboldt Foundation
- DAAD (Germany)
- Russian Foundation for Basic Research [11-02-91341, 11-02-90420, 12-02-97029, 12-02-00528]
- DFG (Germany) [CH 179/22-1]
- State Fund for Fundamental Researches of Ukraine [40.2/019]
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Ion implantation was used to locally modify the surface of silica glass to create periodic plasmonic microstructures with Cu nanoparticles. Nanoparticles were synthesized by Cu-ion irradiation of the silica glass at the ion energy of 40 keV, dose of 5x10(16) ions/cm(2) and current density of 5 mu A/cm(2). This procedure involves low-energy ion implantation into the glass through a mask placed at the surface. Formation of nanoparticles was observed by optical spectroscopy and atomic force microscopy. The presented results clearly demonstrate how the low-energy ions can be used for the fabrication of photonic microstructures on dielectric surfaces in a single-step process.
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