Journal
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
Volume 103, Issue 4, Pages 1111-1116Publisher
SPRINGER
DOI: 10.1007/s00339-010-6051-z
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Funding
- Ministry of Education, Science and Technology [20090082831]
- Korea National Research Foundation [R11-2007-050-00000-0]
- National Research Foundation of Korea [2007-0056556, 2005-2002435, 핵06B1311] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
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The two-photon stereolithography (TPS) process has strong merits for the direct fabrication of 2-D and 3-D microstructures with sub-100-nm resolution. In this paper, we report an effective fabrication process in which selective ablation-assisted TPS (SA-TPS) was used to ameliorate some of the limitations of the TPS process. In SA-TPS, two processes (namely, an additive process of two-photon induced photocuring and a subtractive process of selective laser ablation) were performed sequentially using a single femtosecond laser optical scanning system. The effectiveness of the proposed process was demonstrated in several applications, including precise high-resolution patterning at resolution levels higher than those achievable using the TPS process, and the fabrication of structures with high mechanical sensitivity.
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