TiO2 microstructures by inversion of macroporous silicon using atomic layer deposition

An approach is presented which is capable of fabricating arbitrarily shaped three-dimensional microstructures. Two methods-namely, macroporous silicon and atomic layer deposition-are combined to realize structures in the micrometer and submicrometer range. Using TiO2 as an example, the fabrication of single hollow objects as well as complex network structures is shown. The scalability and the wide range of applicable materials are the key points of this method for future applications.