4.6 Article

Domain evolution in ferroelectric thin films during fatigue process

Journal

JOURNAL OF APPLIED PHYSICS
Volume 97, Issue 10, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.1894603

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A combination of piezoresponse force microscopy and x-ray diffraction sin(2) psi stress measurement have been used to investigate domain evolutions in (111)-oriented Pb(Zr0.55Ti0.45)O-3 (PZT) and (115)-oriented SrBi2Ta2O9 (SBT) thin films with the repeated switching cycles (fatigue process). In the PZT film, it has been found that 90 degrees a-c domain walls form at the beginning of fatigue process and increase in amount with accumulation of switching cycles, accompanied by increase of stress. However, domain pattern and stress in the SBT film seem to be unchanged as the fatigue process is going on. The increase in stress with the repeated switching cycles in the PZT him can be attributed to the lattice distortion caused by polarization rotation. On the contrary, polarization switching in SBT involves little lattice distortion and lets it in a nearly stress-free status during the fatigue process. The difference in domain evolution during the fatigue process suggests the important role of stress in fatigue behaviors of PZT and SBT films. (c) 2005 American Institute of Physics.

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