4.3 Article

Preparation and characterization of electrodeposited indium selenide thin films

Journal

CRYSTAL RESEARCH AND TECHNOLOGY
Volume 40, Issue 6, Pages 557-562

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/crat.200410383

Keywords

InSe; electrodeposition; XRD; SEM; EDAX; Raman

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Indium Selenide (InSe) thin films were deposited from a mixture of Indium chloride and selenium dioxide in aqueous solution by electrodeposition technique on Indium Tin oxide coated glass substrates. The effects of the parameters during deposition such as current density, deposition potential versus saturated calomel electrode, pH value and concentration of source material were studied. X-ray diffraction studies were carried out on the films to analyze the microstructure using an x-ray diffractometer and were examined by RAMAN spectroscopy. The Raman peak position did not change much with chemical concentrations. Raman scattering due to the (LO) phonon was observed at 211 cm(-1). Optical absorption studies were performed with a double beam ultra violet-visible -NIR spectrophotometer in the wavelength 300 - 1100 nm. The surface morphology of the layer was examined using a scanning electron micrograph. The composition of the films was studied using an Energy Dispersive Analysis by X-Rays (EDAX).

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