Journal
NANOTECHNOLOGY
Volume 16, Issue 6, Pages 846-849Publisher
IOP PUBLISHING LTD
DOI: 10.1088/0957-4484/16/6/039
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Studies on two-photon lithography in negative SU-8 photoresist demonstrate the possibility of obtaining mechanically stable, stress-free, extended nanorods having lateral sizes of about 30 nm (corresponding to lambda/25 resolution). The high resolution achievable with the given combination of materials and fabrication techniques demonstrates its potential for the fabrication of large-scale nanostructures, such as photonic crystals with photonic stop gaps at visible wavelengths.
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