The role of Triton surfactant in anisotropic etching of {110} reflective planes on (100) silicon

Etching characteristics and properties of {110} silicon crystal planes used as 45 degrees optical mirrors for deflecting optical beams from/to optical fibers were investigated. Fiber aligning grooves and passive mirror-like planes were realized by wet micromachining of (100) silicon in KOH-IPA and TMAH-IPA systems. Implementation of Triton-x-100 surfactant as an additive to 25% TMAH in anisotropic etching of 11101 silicon passive mirror planes is reported and discussed. It was found that Triton-x-100 contents in the range of 10-200 ppm to the 25% TMAH-water etchant significantly increase the anisotropy mostly by decreasing the {110} etch rate and retaining the {100} etch rate. It is also shown that {101} surface roughness is substantially improved compared to two other etching systems. Furthermore, efficient convex corner underetching reduction is demonstrated. The results of optical characterization of passive mirrors with 632 nm incident light show reduced scattering of reflected optical beam due to improved microroughness for mirrors made by TMAH-Triton. For the reflection of the optical beam with 1.33 mu m and 1.54 mu m wavelengths, sputtered layer of gold is used as reflective coating on silicon mirrors thus increasing the reflected optical beam intensity by an additional 8%.