Journal
OPTICS EXPRESS
Volume 13, Issue 12, Pages 4406-4413Publisher
OPTICAL SOC AMER
DOI: 10.1364/OPEX.13.004406
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Using a single interferometric lithography patterning step along with self-aligned pattern-definition techniques, uniform, large-area metallic coaxial arrays with similar to 100-nm toroidal gaps are fabricated. Enhanced ( 5 x) mid-infrared ( 4 mu m) transmission through these sub-wavelength coaxial arrays is observed as compared with that through the same fractional opening area hole arrays as a result of the complex coaxial unit cell. Varying the coaxial dimensions shifts the resonance wavelength and impacts the maximum transmission; design rules are derived. The ability to control the transmission wavelength combined with dramatically enhanced transmission represent a promising path toward nanophotonic applications. (C) 2005 Optical Society of America.
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