Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Volume 23, Issue 4, Pages 1585-1588Publisher
A V S AMER INST PHYSICS
DOI: 10.1116/1.1978892
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Two-dimensional (2D) photonic crystal patterns have been fabricated by an improved nanosphere lithography method. By introducing an intermediary SiO2 layer between the self-assembled layer and the substrate, this method can be applied to a wide range of materials without much concern for their surface hydrophilicity. The controllability of the photonic crystal patterns has also been investigated. The air-filling factor of the photonic crystal patterns can be easily tailored by thinning the polymer nanospheres in inductively coupled O-2 plasma with a controllable etch rate. Large-area ordered 512 nm pitch hole array, with vertical and smooth sidewalls, has been successfully formed on a GaAs substrate, indicating the potential application in photonic crystal devices of this method. (c) 2005 American Vacuum Society.
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