Journal
APPLIED PHYSICS LETTERS
Volume 87, Issue 3, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.1996845
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Ar ion beam etching and inductively coupled SF6 and C4F8 plasma-etching processes have been employed to fabricate free standing membrane from the heteroepitaxial La1-x(Sr,Ca)(x)MnO3(50 nm)/Bi4Ti3O12(100 nm)/CeO2(40 nm)/YSZ(30 nm) film structure pulsed laser deposited on Si(001) wafer. We demonstrate feasibility to use epitaxial colossal magnetoresistive manganite film as thermally isolated self-supporting membrane for uncooled infrared microbolometer applications. (c) 2005 American Institute of Physics.
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