Journal
ANALYTICAL AND BIOANALYTICAL CHEMISTRY
Volume 382, Issue 8, Pages 1791-1799Publisher
SPRINGER HEIDELBERG
DOI: 10.1007/s00216-005-3365-3
Keywords
ion-beam techniques; atomic layer deposition; thin films; electroluminescent displays; high-k insulators
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This review introduces the possibilities of ionbeam techniques for the analysis of thin films and thin film structures processed by atomic layer deposition (ALD). The characteristic features of ALD are also presented. The analytical techniques discussed include RBS, NRA and ERDA with its variants, viz. the TOFERDA and HI-ERDA. The thin film examples are taken from flat-panel display technology (TFEL structures) and the semiconductor industry (high-k insulators).
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