4.7 Article

Printing methods and materials for large-area electronic devices

Journal

PROCEEDINGS OF THE IEEE
Volume 93, Issue 8, Pages 1491-1499

Publisher

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/JPROC.2005.851492

Keywords

amorphous silicon; flat-panel display; polymer semiconductors; thin-film transistor

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Two digital printing methods for the fabrication of active matrix thin-film transistor (AM-TFT) backplanes for displays are described. A process using printed resists layers, referred to as digital lithography was used to fabricate arrays of hydrogenated amorphous silicon TFTs. TFTs were also fabricated using a combination. on of digital lithography to pattern metals and inkjet printing to pattern and deposit a polymeric semiconducting layer The relative performance of amorphous silicon and polymer TFTs were evaluated. The utility of digital lithographic processing was demonstrated by the fabrication of prototype reflective displays using electrophoretic media.

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