4.6 Article

The structure and properties of copper oxide and copper aluminium oxide coatings prepared by pulsed magnetron sputtering of powder targets

Journal

VACUUM
Volume 79, Issue 3-4, Pages 221-230

Publisher

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.vacuum.2005.03.011

Keywords

pulsed magnetron sputtering; powder targets; p-type semiconductors; copper oxide coatings; copper aluminium oxide coatings

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The development of p-type semiconductor, is one of the key technologies for p-n junction-based devices, such as diodes, transistors and li.-ht-emitting diodes. Copper oxide and copper aluminium oxide (CuAlO2) coatings are known to show p-type conductivity and, as a consequence, these materials are attracting increasing attention. In this study, therefore, various copper oxide and CuAlO2 films were deposited by pulsed magnetron sputtering from loosely packed powder targets, formed from either Cu2O powder alone, or blends of Cu2O and Al2O3 powders, in a rig specifically designed for the purpose. The coatings were deposited at varying partial pressures of oxygen and then annealed at atmospheric pressure. The optical, electrical and structural properties were determined using a range of techniques including spectrophotometry, four-point probe, scanning electron microscopy and X-ray diffraction. Analysis of the films showed that, in the former case, crystalline Cu2O and CuO structures could be produced, depending on the oxygen partial pressure during deposition and the post-deposition annealing conditions. The as-deposited Cu2O films were found to have a very high optical transmittance in the visible range with up to 95 % transmission. In comparison, the CuO films showed lower transmittance in the visible range, but greater transmittance in the IR range. The optical band gaps obtained from the transmittance and reflectance measurements were 2.44 and 1.78 eV for Cu2O and CuO, respectively. The CuAlO2 coatings were also found to be crystalline, with optical and electrical properties again dependant on the deposition and annealing conditions. The direct deposition of transparent conductive oxide films front loosely packed powder targets by pulsed magnetron sputtering is a novel. highly versatile technique for the deposition of this type of material. (c) 2005 Elsevier Ltd. All rights reserved.

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