Journal
JOURNAL OF PHYSICAL CHEMISTRY B
Volume 109, Issue 38, Pages 17787-17790Publisher
AMER CHEMICAL SOC
DOI: 10.1021/jp0533224
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We have investigated the formation of tungsten oxide nanowires under different chemical vapor deposition (CVD) conditions. We find that exposure of oxidized tungsten films to hydrogen and methane at 900 degrees C leads to the formation of a dense array of typically 10 nm diameter nanowires. Structural and chemical analysis shows that the wires are crystalline WO3. We propose a chemically driven whisker growth mechanism in which interfacial strain associated with the formation of tungsten carbide stimulates nanowire growth. This might be a general concept, applicable also to other nanowire systems.
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