Journal
NANOTECHNOLOGY
Volume 16, Issue 10, Pages 1986-1992Publisher
IOP PUBLISHING LTD
DOI: 10.1088/0957-4484/16/10/002
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Nanocolumn pseudo-regular arrays of silicon with controlled aspect ratio and porosity are fabricated by electron-beam evaporation using the glancing angle deposition (GLAD) method with vapour impinging at oblique incidence onto rapidly rotating substrates. The width W at positions 37 along the height of one individual column scales with y following a power law dependence W similar to y(p). We demonstrate that the scaling exponent value, p, can be modified from 0.6 to 0.3 by varying the vapour incidence angle from 75 degrees to a glancing 89 degrees from the substrate normal. This exponent is an important morphological factor for thin films, as it determines the morphological correlation length, nanocolumn profile, size, and spacing. The nanocolumn mean diameter can be varied between 12 and 40 rim, while the intercolumnar spacing can be adjusted between 37 and 85 nm via changing the incidence angle. The growth mechanism and film morphology are explored in detail.
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