4.5 Article

An in situ copper plated boron-doped diamond microelectrode array for the sensitive electrochemical detection of nitrate

Journal

ELECTROANALYSIS
Volume 17, Issue 20, Pages 1806-1815

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/elan.200503316

Keywords

boron-doped diamond array; copper microelectrode array; nitrate detection; electrocatalysis; copper modification

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The first example of using a copper microelectrode array for use in electroanalysis is explored and exemplified with the electroanalytical quantification of nitrate. The analytical approach is based upon the in situ deposition of copper at a boron-doped diamond (BDD) microelectrode array. The immobilized copper layer is electrocatalytic for nitrate reduction and exhibits an analytically useful range front 1.2 to 124 mu M with a marked selectivity for nitrate ion over nitrate, with a limit of detection of 0.76 mu M. The analytical applicability was examined through standard addition determinations of nitrate in drinking and river water samples.

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