Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 23, Issue 6, Pages 1687-1690Publisher
A V S AMER INST PHYSICS
DOI: 10.1116/1.2073447
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In this paper we report a simple and effective method that renders direct imprinting of sub-micron structures onto PMMA resist coated on large area and curved substrates using the PDMS mold on a closed chamber. Nitrogen gas was employed to generate a uniform pressure. The patterns of the soft mold could be replicated with high quality over an entire 12, in. resist-coated area. The process was further successfully applied to the imprinting of a curved substrate. (c) 2005 American Vacuum Society.
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