Journal
MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS
Volume 11, Issue 12, Pages 1287-1291Publisher
SPRINGER
DOI: 10.1007/s00542-005-0612-7
Keywords
silicon; wet etching; triangular gratings; sharp edges
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Triangular silicon gratings of different size (periods from 0.8 to 25.0 mu m) are manufactured by wet chemical etching. Two main principles of preparation are used and improved. The received gratings are investigated and characterized by SEM concerning the uniformity and the sharpness of the convex edges and the concave notches. Their very small radii determined by TEM are reported for the first time. The gratings can be applied to optical purposes or as standards for surface metrology.
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