4.6 Article

High-performance dual-gate carbon nanotube FETs with 40-nm gate length

Journal

IEEE ELECTRON DEVICE LETTERS
Volume 26, Issue 11, Pages 823-825

Publisher

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2005.857704

Keywords

carbon nanotube (CN); dual gate; field-effect transistor (FET); short-channel effect

Ask authors/readers for more resources

We report on a high-performance back-gated carbon nanotube field-effect transistor (CNFET) with a peak transconductance of 12.5 mu S and a delay time per unit length of tau/L = 19 ps/mu m. In order to minimize the parasitic capacitances and optimize the performance of scaled CNFETs, we have utilized a dual-gate design and have fabricated a 40-nm-gate CNFET possessing excellent subthreshold and output characteristics without exhibiting short-channel effects.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.6
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available