Journal
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
Volume 5, Issue 11, Pages 1792-1800Publisher
AMER SCIENTIFIC PUBLISHERS
DOI: 10.1166/jnn.2005.434
Keywords
photolithographic pattering; photolithography; dendrimer; poly(propyleneimine) dendrimer; poly(amido amine) dendrimer; self-assembled monolayer; n-octa-decyltrimethoxysilane; atomic force microscopy; surface-enhanced infrared; absorption Spectroscopy; poly-/-glutamic acid; sodium hyaluronate; DNA; linear macromolecule
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Alkyl groups of n-octadecyltrimethoxysilane (ODS) in a self-assembled monolayer on a silicon substrate were oxidized to carboxyl groups by partial irradiation of vacuum ultra-violet light under the photomask, producing a COOH/ODS line pattern. After active esterification of carboxyl groups, two kinds of amine-terminated dendrimers, poly(propyleneimine) and poly(amido amine) (PAMAM) dendrimers, were immobilized on a COOH line through amide-bond so that photolithographic dendrimer/ODS pattern was finally fabricated. Preparation was certified by atomic force microscopy (AFM) and surface-enhanced infrared absorption spectroscopy at transmission mode. Adsorption of linear macromolecules was examined on PAMAM dendrimer/ODS pattern. After adsorption of poly-L-glutamic acid (PGA) at a pH below a-helix-random coil transition, rod-shape texture was observed only on the dendrimer line in an AFM image. This texture is an aggregate of a-helical PGA. Sodium hyaluronate and DNA were also adsorbed selectively on the dendrimer line, keeping the line profile, although characteristic textures were not observed.
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