Journal
MATERIALS RESEARCH BULLETIN
Volume 40, Issue 11, Pages 1899-1904Publisher
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.materresbull.2005.06.013
Keywords
surface; vapor deposition; photoelectron spectroscopy; catalytic properties
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Activated carbon (AC) modified by HNO3, H2O2 and N-2 + O-2 was selected as the support during metal organic chemical vapor deposition (MOCVD) production of TiO2 photocatalysts in order to enhance the concentration of TiO2 on the external surface of AC. The catalytic performance of the HNO3 modified AC supported TiO2 catalyst was significantly higher than that of the original AC supported TiO2 catalyst due to the increased concentration of TiO2 on the external surface of AC confirmed by XPS and EDAX. (C) 2005 Elsevier Ltd. All rights reserved.
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