Journal
PROGRESS IN PHOTOVOLTAICS
Volume 13, Issue 8, Pages 691-695Publisher
JOHN WILEY & SONS LTD
DOI: 10.1002/pip.632
Keywords
silicon1; texturization; light trapping
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We present a new texturing technique applicable to silicon solar cells. The technique is based on the isotropic etching of silicon through a very thin layer of silicon nitride, deposited by low-pressure chemical vapor deposition. Spectrophotometry measurements show that the resulting surface texture displays low reflectivity after encapsulation behind glass, and nearly ideal light-trapping behaviour. The surfaces can also be well passivated using standard passivation techniques. Emitter dark saturation currents in the range 4-5 X 10(-14) A/cm(2) have been measured by quasi-steady-state photoconductance following the growth of a thermal oxide. Copyright (c) 2005 John Wiley & Sons, Ltd.
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