Ripple pattern formation on silicon surfaces by low-energy ion-beam erosion:: Experiment and theory -: art. no. 235310

The topography evolution of Si surfaces during low-energy noble-gas ion-beam erosion (ion energy <= 2000 eV) at room temperature has been studied. Depending on the ion-beam parameters, self-organized ripple patterns evolve on the surface with a wavelength lambda < 100 nm. Ripple patterns were found to occur at near-normal ion incidence angles (5 degrees-30 degrees) with the wave vector oriented parallel to the ion-beam direction. The ordering and homogeneity of these patterns increase with ion fluence, leading to very-well-ordered ripples. The ripple wavelength remains constant with ion fluence. Also, the influence of ion energy on the ripple wavelength is investigated. Additionally it is shown that the mass of the bombarding ion plays a decisive role in the ripple formation process. Ripple patterns evolve for Ar+,Kr+, and Xe+ ions, while no ripples are observed using Ne+ ions. These results are discussed in the context of continuum theories and by using Monte Carlo simulations.