Journal
TALANTA
Volume 68, Issue 3, Pages 659-665Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.talanta.2005.05.011
Keywords
ion-enrichment; ion-depletion; ion-accumulation; nanochannels; amorphous silicon
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A unique phenomenon, ion-enrichment and ion-depletion effect, exists in nanofluidic channels and is observed in amorphous silicon (alpha-Si) nanochannels as shallow as 50 nm. As a voltage is applied across a nanochannel, ions are rapidly enriched at one end and depleted at the other end of the nanochannel. alpha-Si is deposited on glass by plasma enhanced chemical vapor deposition and is selectively etched to form nanochannels. The depth of nanochannels is defined by the thickness of the a-Si layer. Low temperature anodic bonding of alpha-Si to glass was used to seal the channel with a second glass wafer. The strength of the anodic bond was optimized by the introduction of a silicon nitride adhesion promoting layer and double-sided bonding resulting from the electric field reversal. Completed channels, 50 nm in depth, 5 micron wide, and I mm long were completely and reliably sealed. Structures based on nanochannels 50-300 nm deep were successfully incorporated into nanofluidic devices to investigate ionic accumulation and depletion effect due to overlapping of electric double layer. (c) 2005 Elsevier B.V. All rights reserved.
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