Journal
REVIEW OF SCIENTIFIC INSTRUMENTS
Volume 77, Issue 2, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.2163973
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We present an approach by which submicrometer-spaced electrical contacts can be fabricated on virtually any surface under ultrahigh-vacuum conditions. The metallic contacts are formed by subsequent deposition through a macroscopic mask and a nanostructured stencil mask. The stencil mask with a high aspect ratio was obtained by nanopatterning of suspended low-stress Si3+xN4-x membranes with a focused ion-beam system. The fabricated contacts can be electrically connected in situ by simply exchanging the mask carrier by a second, spring-loaded, carrier. (c) 2006 American Institute of Physics.
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