4.6 Article

Flexible substrate micro-crystalline silicon and gated amorphous silicon strain sensors

Journal

IEEE TRANSACTIONS ON ELECTRON DEVICES
Volume 53, Issue 2, Pages 380-385

Publisher

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TED.2005.861727

Keywords

flexible electronics; strain sensors; semiconductor devices; strain measurement; thin films; thin-film transistors (TFTs)

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We present two different kinds of semiconductor strain sensors: ungated n+ micro-crystalline silicon (n + mu C-Si), and gated hydrogenated amorphous silicon (a-Si:H). Both sensor types are fabricated on flexible polyimide substrates. The sensors were characterized with bending perpendicular, parallel, and at 450 with respect to the sensor bias direction, and for several bending diameters. Sensor size and power consumption are significantly reduced compared to metallic foil strain sensors. Small sensor size and ease of integration with a-Si:H thin-film transistors also allows arrays of strain sensors or combinations of strain sensors with varying geometric orientation to allow strain direction as well as magnitude to be unambiguously determined. Index Terms-Flexible electronics, strain sensors, semiconductor devices, strain measurement, thin films, thin-film transistors (TFTs).

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