Journal
POLYMERS FOR ADVANCED TECHNOLOGIES
Volume 17, Issue 2, Pages 94-103Publisher
WILEY
DOI: 10.1002/pat.662
Keywords
lithography; extreme ultraviolet (EUV); molecular glass; block copolymers; nanotechnology
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The nanotechnology revolution of the past decade owes much to the science of lithography, an umbrella term which encompasses everything from conventional photolithography to unconventional soft lithography and the self-assembly of block polymers. In this review, some of the recent advances in lithography are summarized with special reference to the microelectronics industry. The next generation photolithography, two-photon lithography, step-and-flash imprint lithography and nanofabrication using block copolymers are covered, in an attempt to describe more recent work in this vibrant and active field of research. Copyright (c) 2006 John Wiley & Sons, Ltd.
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