4.4 Article

Strain relaxation and surface morphology of nickel oxide nanolayers

Journal

SURFACE SCIENCE
Volume 600, Issue 5, Pages 1099-1106

Publisher

ELSEVIER SCIENCE BV
DOI: 10.1016/j.susc.2005.12.038

Keywords

epitaxial thin films; growth; oxide nanolayer; nickel oxides; palladium (100); scanning tunneling microscopy (STM); high-resolution LEED (HR-LEED, SPA-LEED); morphology

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The surface morphology and the lattice constants of NiO overlayers in the thickness range of 1-20 monolayers (NiO nanolayers) on Pd(100) have been investigated by high-resolution spot profile low-energy electron diffraction (SPA-LEED) and scanning tunneling microscopy (STM). NiO islands grow epitaxially on Pd(100) on top of a c(4 x 2) Ni3O4 monolayer with a compressed strained lattice, which relaxes gradually attaining the bulk lattice constant at 10-12 monolayers. The strain relaxation is accompanied by the formation of small angle mosaic defect regions at the surface, which have been characterised quantitatively by following the behaviour of the satellites to the main Bragg diffraction rods. The analysis of the diffuse scattering intensity around the (00) diffraction spot reveals anisotropic NiO island shapes, whose orientation depends oil the growth conditions. An incommensurate superlattice in LEED and STM at intermediate NiO coverages (similar to 2-6 monolayers) is observed and its origin is discussed. (c) 2006 Elsevier B.V. All rights reserved.

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