Journal
JOURNAL OF OPTICS A-PURE AND APPLIED OPTICS
Volume 8, Issue 3, Pages 345-349Publisher
IOP PUBLISHING LTD
DOI: 10.1088/1464-4258/8/3/019
Keywords
photonic crystal; polarization beam splitter; interference lithography
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We present a design for a high-efficiency polarization beam splitter based on a two-dimensional hexagonal polymer photonic crystal, which can be fabricated directly in SU-8 photoresist using interference lithography. Computer simulations show that more than 99.9% of TM-polarized light is reflected by the polarization beam splitter, whereas 98.9% of TE-polarized light propagates through the polarization beam splitter over the wavelength range 1.53-1.62 mu m (C and L bands for optical communication) with good angular insensitivity of about 10 degrees. The present polarization beam splitter has a reasonably good tolerance of fabrication errors.
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