Journal
MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS
Volume 26, Issue 2-3, Pages 164-168Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.msec.2006.01.002
Keywords
silicon tips; FIB; DRIE
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We have studied the fabrication of high-aspect ratio silicon tips by a combination of deep reactive ion etching and focused ion beam. The reactive ion etching is used to obtain so-called rocket tips which can be fabricated with a high aspect ratio. The rocket tips are further processed by using a focused ion beam to obtain nanotips at their apex. Typical results obtained are nanotips with a basis radius of 200 nm and a height of 2.5 mu m, with an apex radius of 5 nm, located on top of a 3 mu m wide and 9 mu m high silicon column. The process would allow however obtaining column heights of several tens of microns. (c) 2006 Elsevier B.V All rights reserved.
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