Journal
NANOTECHNOLOGY
Volume 17, Issue 5, Pages 1225-1229Publisher
IOP PUBLISHING LTD
DOI: 10.1088/0957-4484/17/5/010
Keywords
-
Ask authors/readers for more resources
We report a systematic investigation of the effect of different inert gases on chemical vapour deposition (CVD) of nano-crystal line diamond. The surface morphology and growth rate of the nano-structure CVD films were characterized by Raman spectroscopy and different microscopic techniques. In situ optical emission measurement was employed to monitor the plasma chemistry, which possibly influences the film growth. Our result indicates that C-2 is not necessarily the key growth species for nano-crystalline diamond and we demonstrate here that the nano-crystalline diamond film can be grown under conditions where the C-2 concentration is very small. Modelling results support the trend in number density changes for intermediate radicals with the volume percentage of argon variation for CH4/H-2/Ar plasma.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available