Journal
APPLIED PHYSICS LETTERS
Volume 88, Issue 13, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.2172742
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We demonstrate the growth of a low dislocation density, relaxed GaSb bulk layer on a (001) GaAs substrate. The strain energy generated by the 7.78% lattice mismatch is relieved by a periodic array of 90 degrees misfit dislocations. The misfit array is localized at the GaSb/GaAs interface and has a period of 5.6 nm which is determined by transmission electron microscope images. No threading dislocations are visible. The misfits are identified as 90 degrees, rather than 60 degrees, using Burger's circuit analysis, and are therefore not associated with generation of threading dislocations. A low dislocation density and planar growth mode is established after only 3 monolayers of GaSb deposition as revealed by reflection high-energy electron diffraction patterns. Calculations corroborate the materials characterization and indicate the strain energy generated by the 7.78% lattice mismatch is almost fully dissipated by the misfit array. The low dislocation density bulk GaSb material on GaAs enabled by this growth mode will lead to new devices, especially in the infrared regime, along with novel integration schemes. (c) 2006 American Institute of Physics.
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