Journal
MICROELECTRONIC ENGINEERING
Volume 83, Issue 4-9, Pages 1482-1486Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.mee.2006.01.146
Keywords
focused electron beam induced deposition-; electron scattering; 3D structures
Ask authors/readers for more resources
We present evidence that the penetration of electrons in solids, typically a few micrometers at the usual acceleration voltages used in electron microscopes, influences the shape of sub-micro structures created by focused electron beam induced deposition. We demonstrate how monitoring the sample current during deposition gives information on the electron scattering. A physical model is proposed and checked on a series of structures ranging from films to tips and complex 3D shapes. This method provides an efficient quality control tool for the process, witnesses the deposition sequence, and offers a signature of the electron scattering in microstructures. (c) 2006 Elsevier B.V. All rights reserved.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available