Journal
MICROELECTRONIC ENGINEERING
Volume 83, Issue 4-9, Pages 1339-1342Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.mee.2006.01.047
Keywords
inductive grid filter; infrared rejection; metallic nanostructures
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We developed a fabrication method for free-standing metal structures with high aspect ratios to manufacture inductive grid filters for infrared rejection. Deep grooves in thermally evaporated SiO2 layer, fabricated by electron beam lithography and etching, were filled with iridium by atomic layer deposition technique. Characterization shows that the fabricated structures can suppress infrared radiation over two orders of magnitude while transmitting 40% of XUV radiation. (c) 2006 Elsevier B.V. All rights reserved.
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