Simulation of ion beam direct structuring for 3D nanoimprint template fabrication

A software tool (Ionshaperl) has been developed which allows calibrated high precision simulation of ion beam processing. The continuum model is based on a discrete surface element approach that includes first and second-order sputtering and re-deposition in 2D. Atomistic effects are implicitly included by adjusting various simulation parameters to fit atomistic Monte Carlo simulations. Predicted spatial and temporal surface evolution is in good agreement with focused ion beam experiments. (c) 2006 Elsevier B.V. All rights reserved.