Effect of substrate temperature on the physical properties of dc magnetron sputtered Cu2O films

Cuprous oxide (Cu2O) films were formed by dc reactive magnetron sputtering onto glass substrates held at various temperatures in the range 303 - 648 K. The substrate temperature was found to be an important parameter in controlling the physical properties of the deposited films. The variation of cathode potential and deposition rate with the substrate temperature was studied. The dependence of crystallographic structure, electrical properties and optical absorption of the films on the substrate temperature was systematically investigated. (c) 2006 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.