Journal
MICROELECTRONIC ENGINEERING
Volume 83, Issue 4-9, Pages 880-883Publisher
ELSEVIER
DOI: 10.1016/j.mee.2006.01.010
Keywords
nanoimprint lithography; viscous flow; computer simulation; stamp deformation
Ask authors/readers for more resources
Sets of approximate equations that describe the resist flow under a nanoimprint lithography stamp are derived from 3D Navier-Stokes equations. Special finite-difference schemes are built. These schemes permit to apply by modeling a reasonable coarse grid. The obtained numerical model provides the calculation of imprinting pressures and velocities under several loading regimes: constant imprint velocity or constant applied force. Comparisons with experimental data result in a satisfying qualitative agreement. The analysis of these results led to the conclusion that quantitative correspondence may be achieved by further taking into account the deformation of the stamp. (c) 2006 Elsevier B.V. All rights reserved.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available