4.6 Article

Hydrogen self-trapping near silicon atoms in Ge-rich SiGe alloys

Journal

APPLIED PHYSICS LETTERS
Volume 88, Issue 14, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.2193802

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Infrared absorption spectroscopy and ab initio density functional modeling are used to investigate hydrogen defects that are stable at and above room temperature in proton-implanted Ge-rich SiGe alloys. We find that Si atoms are effective nucleation sites for hydrogen, leading to the formation of a dominant defect closely related to the H-2(*) dimer in pure Si and Ge. The minority Si species in the alloys stabilizes the new complex, and strongly reduces the trapping efficiency of hydrogen by vacancies and self-interstitials. (c) 2006 American Institute of Physics.

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