Journal
JOURNAL OF APPLIED PHYSICS
Volume 99, Issue 8, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.2159395
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Nonlocal measurements are performed on a multiterminal device to in situ determine the spin-diffusion length and in combination with resistivity measurements also the spin-relaxation time in Al films. By varying the thickness of Al we determine the contribution to spin relaxation from surface scattering. From the temperature dependence of the spin-diffusion length it is established that the spin relaxation is impurity dominated at low temperature. A comparison of the spin- and momentum-relaxation lengths for different thicknesses reveals that the spin-flip scattering at the surfaces is weak compared to that within the bulk of the Al films. (C) 2006 American Institute of Physics.
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