4.4 Article Proceedings Paper

Low-temperature growth of Si-based organic-inorganic hybrid materials, Si-O-C and Si-N-C, by organic Cat-CVD

Journal

THIN SOLID FILMS
Volume 501, Issue 1-2, Pages 190-194

Publisher

ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2005.07.239

Keywords

chemical vapour deposition; catalysis; optical coating; organic-inorganic hybrid materials

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This paper describes the recent development of organic catalytic CVD (O-Cat-CVD), which is an extension of the conventional Cat-CVD technique to organic substances. O-Cat-CVD Utilizes various types of metal organic (MO) compounds as Cat-CVD sources. Various functional organic-inorganic hybrid materials can be prepared on the basis of MO molecules. The growth and properties of Si-based organic-inorganic materials, Si-O-C and Si-N-C, are described with emphasis on the microscopic chemical-bonding structures depending on the source molecules. The application to a micro Fresnel lens array and selective oxidation mask of Si-O-C and Si-N-C are also demonstrated. (c) 2005 Elsevier B.V. All rights reserved.

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