Journal
THIN SOLID FILMS
Volume 501, Issue 1-2, Pages 195-197Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2005.07.210
Keywords
SiN; SiCN; hexamethyldisilazane
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SiCN films were deposited by Hot-wire CVD method using Hexamethyldisilazane (HMDS) which is an organic liquid material without exposition. It is found that SiCN films can be deposited using only HMDS as a source material. It is also found that the composition ratio of SiCN can be controlled by changing the flow rate of NH3, (c) 2005 Elsevier BY All rights reserved.
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