Journal
SURFACE & COATINGS TECHNOLOGY
Volume 200, Issue 16-17, Pages 4737-4740Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.surfcoat.2005.04.008
Keywords
cubic boron nitride; chemical vapor deposition; annealing; adhesion; Raman
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Effects of in situ annealing oil adhesion and structure of thick and highly crystallized cubic boron nitride films deposited by bias assisted dc jet plasma chemical vapor deposition were investigated. Improvement of adhesion by in situ annealing was observed. The full width at half maximum of Raman and X-ray diffraction peaks decreased after in situ annealing. The calculated crystal size increases from 18.4 to 27.2 rim after in situ annealing at 1060-1100 degrees C. Thick and highly crystallized cubic boron nitride films were obtained by combining our growth process and the in situ annealing. (c) 2005 Elsevier B.V. All rights reserved.
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