Journal
JOURNAL OF LIGHTWAVE TECHNOLOGY
Volume 24, Issue 5, Pages 2207-2218Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/JLT.2006.872298
Keywords
add-drop filters; coupling-induced frequency shifts (CIFS); electron-beam (e-beam) proximity effects; fabrication; microring resonators
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Frequency mismatches between resonators significantly impact the spectral responses of coupled resonator filters, such as high-order microring filters. In this paper, techniques allowing fabrication of frequency-matched high-index-contrast resonators are proposed, demonstrated, and analyzed. The main approach consists of inducing small dimensional changes in the resonators through alteration of the electron-beam dose used to expose either the actual resonator on a wafer or its image on a lithographic mask to be later used in filter fabrication. Third-order microring filters fabricated in silicon rich silicon nitride, with optical resonator frequencies matched to better than 1 GHz, are reported. To achieve this, the average ring-waveguide widths of the microrings area. matched to within less than 26 pm of a desired relative width offset. Furthermore, optimization and calibration procedures allowing strict dimensional control and smooth sidewalls are presented. A 5-nm dimensional control is demonstrated, and the standard deviation of sidewall roughness is reduced to below 1.6 nm.
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