Two-dimensional atomic lithography by submicrometer focusing of atomic beams

We analyze a method for serial writing of arbitrary two-dimensional patterns using optical focusing of a collimated atomic beam. A spatial light modulator is used in a side illumination geometry to create a localized optical spot with secondary maxima that are well separated from the central peak. Numerical simulation of a lithography experiment using a magneto-optical trap as a source of cold Cs atoms, collimation and cooling in a magnetic guide, and optical focusing predicts FWHM pixel sizes of 110 X 110 nm and writing times of similar to 20 ms/pixel. (c) 2006 Optical Society of America.